AS35503/ST01

主營：世界知名品牌的PLC 、DCS 系統備件 模塊

①Allen-Bradley(美國AB)系列產品》

②Schneider(施耐德電氣)系列產品》

③General electric(通用電氣)系列產品》

④Westinghouse（美國西屋）系列產品》

⑤SIEMENS(西門子系列產品)》

⑥銷售ABB Robots. FANUC Robots、YASKAWA Robots、KUKA Robots、Mitsubishi Robots、OTC Robots、Panasonic Robots、MOTOMAN Robots。

⑦estinghouse（西屋）： OVATION系統、WDPF系統、MAX1000系統備件。

⑧Invensys Foxboro（福克斯波羅）：I/A Series系統，FBM（現場輸入/輸出模塊）順序控制、梯形 邏輯控制、事故追憶處理、數模轉換、輸入/輸出信號處理、數據通信及處理等。Invensys Triconex: 冗余容錯控制系統、基于三重模件冗余（TMR）結構的zui現代化的容錯控制器。

⑨Siemens(西門子)：Siemens MOORE， Siemens Simatic C1，Siemens數控系統等。

⑩Bosch Rexroth（博世力士樂）：Indramat，I/O模塊,PLC控制器,驅動模塊等。

◆Motorola（摩托羅拉）：MVME 162、MVME 167、MVME1772、MVME177等系列。

 
* Temp Control Mode : Spike & Profile T/C Select Control Mode
* Spike Thermo Couple Type : “R”-Type
* Max Temp Up Rate : 25℃/min
* Max Temp Down Rate : 3~7℃/min
* Over Temp Detection : Max 700℃, All Zone Excess Temp Detection

 

OP2600 Film Thickness monitor
* The Therma-Wave Opti-Probe 2600 is   for measurement of a wide range of optical parameters such as film thickness of multiple layers and index of refraction.
* Compatible with wafers ranging from 4- to 8-inches, the system has two cassette loader stations.
* The Opti-Probe supports Beam Profile Reflectrometry (BPR) and Beam Profile Ellipsometry (BPE) modes.
* A 675nm thermoelectrically cooled diode laser is   to establish the optical parameter and in spectrometry mode a visible 450 to 840 nm tungsten halogen lamp it  .
* Supports the full range of thick and thin film, refractive indexes, extinction coefficient and reflectivity measurements
  Multi-layer and multi-parameter measurements on thin ONO and OPO film stacks
* BPR (Beam Profile Reflectometry : thick dielectric films > 500A)
* BPE (Beam Profile Ellipsometry : thin dielectric films < 500A)
* Spectrometry (High Index films : C-Si, Poly-Si, A-Si)
 

S-9200 CD-SEM
* Resolution (nm) : 3 / Repeatability (nm) : 3
* Throughput (wafer/h) : 45 (in continuous measurement via recipe, under Hitachi standard test conditions)
* Wafer size (inch) 6, 8
* Principle of CD measurement : Cursor line profile measurement
* CD Measure Range : 0.1 to 2.0μm
* CD Measurement reproducibility : ±1% or 3nm (3 sigma), whichever larger
* Secondary electron image resolution : 3nm(at accelerating voltage of 0.8kV; with reference specimen for resolution measurement)
* Image magnification : SEM image; x500 to x300,000 (CD measurement
* Reproducibility guarantee range: x40,000 to x200,000, excluding effects of contamination or charge-up)
* Optical microscope image; About x110
 

Surfscan SFS-6220 Particle Counter
* Sizes, and counts defects down to 0.09 μm at an 80% capture rate.
  – Wafer Size : 4 – 8 inch.
  – Non-patterned surface Inspection System.
  – 0.1 Micron Defect Sensitivity (PSL STD).
  – 0.02 ppm Haze Sensitivity.
  –  2 ppm Haze Resolution.
  – Accuracy within 1%. / XY coordinates.
  – Lock Down accessories.
  – Defect Map and Histogram with Zoom
  – Haze Map and Histogram with Zoom
  – Argon Ion Laser (488nm)
  – 2D Signal Integration
 

RS75 Four Point Probe System
* Analyze sheet resistance data, on various conductive layers such as implants, diffusion, epi, CVD, metals, and bulk substrates
* Provides accurate and repeatable sheet resistance measurements, from 5 m ohm/sq to 5M ohm/sq on 2-inch to 8-inch wafers, by uniting sophisticated modeling algorithms, advanced analysis techniques, and precision electronics.
  – Model: RS-75 / Four Point Probe System / Up to 200 mm wafers
  – One second per site overall measurement speed
  – A 49-site contour map with temperature compensation can be achieved on a manually loaded test wafer in less than sixty seconds.
  – Provides precise sheet resistance measurements for monitor wafers, with significantly improved speed over existing systems.
  – Ideal for a wide range of semiconductor process monitoring applications such as ion implantation, metal deposition, CMP, diffusion, polysilicon, epi, RTP and bulk silicon.
 

Eclips L200 Microscope + NWL641 Autoloader
* Main Body : 12V-100W halogen lamp light sourde buit-in / power sources for motozised control built-in Motorized control for nosepices.
* Light intensity control. Aperture diaphragm control
* Focus mechanism : Cross travel: 29nm Coarse: 12.7mm per rotation (troque adjustable, refocusing mechanism provided)
* Fine : 0.1mm per rotation (in 1? increments)
* Episcopic illuminator : 12v-100w halogen lamp light source built-in Motorized aperture diaphragm (centerable)
  Fixed field diaphargm (with focus target)Pinhole slider (optional) can be mounted four ?25mm filters(NCB/ND4. 16/GIF) can be mounted. Polarizer. Analyzer
* Eyepiece tube : Ultrawidefield tilting trinocular eyepiece tube (tilt angle: 0-30 ; erect images) F.O.V.: 25mm / Optical path changeover: 2-way